发明名称 |
RF power delivery for plasma processing using modulated power signal |
摘要 |
A plasma processing apparatus and a method of operating a plasma processing apparatus are disclosed. In one embodiment, a first RF signal at a carrier frequency and a second RF signal at a second frequency are generated. An amplitude modulated signal is formed by modulating the first RF signal with the second RF signal. A plasma is generated within the plasma processing chamber using the amplitude modulated signal. Generating plasma using a frequency modulated signal is also disclosed.
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申请公布号 |
US2002096257(A1) |
申请公布日期 |
2002.07.25 |
申请号 |
US20010767282 |
申请日期 |
2001.01.22 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
WANG LIANG-GUO;WONG KWOK M.;SHAMOUILIAN SHAMOUIL;RAMASWAMY KARTIK |
分类号 |
C23C16/507;H01J37/32;(IPC1-7):C23C16/507;H01L21/306 |
主分类号 |
C23C16/507 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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