发明名称 Semiconductor device
摘要 A semiconductor device having a field effect transistor formed in a semiconductor layer provided on an insulating layer is provided with a body electrode electrically connected to a channel forming region of the field effect transistor, and a back gate electrode provided below the insulating layer so as to be opposed to the channel forming region of the field effect transistor. A potential for controlling carriers of conduction type opposite to a channel formed in an upper portion of the channel forming region of the field effect transistor is applied to each of the body electrode and the back gate electrode. Thus, the withstand voltage for the drain of the field effect transistor can be increased. It is also possible to stabilize the threshold voltage of the field effect transistor. Furthermore, the threshold voltage of the field effect transistor can be changed in a stable state.
申请公布号 US2002096718(A1) 申请公布日期 2002.07.25
申请号 US20020084477 申请日期 2002.02.28
申请人 MITANI SHINICHIRO;IKEDA TAKAHIDE;MORI KAZUTAKA;HIGUCHI HISAYUKI 发明人 MITANI SHINICHIRO;IKEDA TAKAHIDE;MORI KAZUTAKA;HIGUCHI HISAYUKI
分类号 H01L29/786;(IPC1-7):H01L27/01 主分类号 H01L29/786
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