发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
<p>Vibrational movement between the top of a lens (11) and a main plate (12) on which the lens is mounted is reduced by attaching between the lens and the main plate a lens support (120) which detects relative movement between the lens and the main plates using piezoelectric sensors (40) and compensates for that movement to reduce vibration using piezoelectric actuators (30) which are in series with the piezoelectric sensors. The control signal which is generated to actuate the actuated piezoelectrics is generated by a controller. <IMAGE></p> |
申请公布号 |
EP1225482(A1) |
申请公布日期 |
2002.07.24 |
申请号 |
EP20020250326 |
申请日期 |
2002.01.17 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
AUER, FRANK;SPANJERS, FRANCISCUS ANDREAS CORNELIS JOHANNES;HOLTERMAN, JAN;KOSTER, MARINUS PIETER;DE VRIES, THEODORUSJACOBUS ADRIANUS |
分类号 |
G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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