发明名称 Tubular target and method for its production
摘要 Tubular target (1) comprises a tubular sputtering material (3) and a supporting tube. The sputtering material has a circular cross-section and concentrically surrounds the tube. The tube protrudes from the sputtering material at the connection to a cathode sputtering device on one end of the target. The part of the supporting tube protruding from the sputtering material is an individual part (2a) attached by a screw. An Independent claim is also included for a process for the manufacture of a tubular target. Preferred Features: The screw is formed from an O-ring seal (5) between a first chamber outside of the target and a second chamber within the target. The sputtering material is made from Ag, Au, Zn, Al, Cu, Nb, Ni, Cu or their alloys; or is made from Si, Sn, In, Bi or their alloys; or is made from ZnO, TIO2 or In-Zn oxide.
申请公布号 EP1225249(A1) 申请公布日期 2002.07.24
申请号 EP20010129511 申请日期 2001.12.11
申请人 W.C. HERAEUS GMBH & CO. KG 发明人 HECK, RALF;LUPTON, DAVID FRANCIS, DR.;STENGER, BERND;WARKENTIN, OLIVER, DR.
分类号 C23C14/34;H01J37/34 主分类号 C23C14/34
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