发明名称 Wafer level interconnection
摘要 RF MicroElectroMechanical Systems (MEMS) circuitry (<HIL><PDAT>15</BOLD><PDAT>) on a first high resistivity substrate (<HIL><PDAT>17</BOLD><PDAT>) is combined with circuitry (<HIL><PDAT>11</BOLD><PDAT>) on a second low resistivity substrate (<HIL><PDAT>13</BOLD><PDAT>) by overlapping the first high resistivity substrate (<HIL><PDAT>17</BOLD><PDAT>) and MEMS circuitry (<HIL><PDAT>15</BOLD><PDAT>) with the low resistivity substrate (<HIL><PDAT>13</BOLD><PDAT>) and circuitry (<HIL><PDAT>11</BOLD><PDAT>) with the MEMS circuitry (<HIL><PDAT>15</BOLD><PDAT>) facing the second circuitry (<HIL><PDAT>11</BOLD><PDAT>). A dielectric lid (<HIL><PDAT>19</BOLD><PDAT>) is placed over the MEMS circuitry (<HIL><PDAT>15</BOLD><PDAT>) and between the first substrate (<HIL><PDAT>17</BOLD><PDAT>) and second substrate (<HIL><PDAT>13</BOLD><PDAT>) with an inert gas in a gap (<HIL><PDAT>21</BOLD><PDAT>) over the MEMS circuitry (<HIL><PDAT>15</BOLD><PDAT>). Interconnecting conductors (<HIL><PDAT>25,31,35,37,39,41</BOLD><PDAT>) extend perpendicular and through the high resistivity substrate (<HIL><PDAT>17</BOLD><PDAT>) and through the dielectric lid (<HIL><PDAT>19</BOLD><PDAT>) to make electrical connection with the low resistivity substrate (<HIL><PDAT>13</BOLD><PDAT>).</PTEXT>
申请公布号 AU2002249861(A1) 申请公布日期 2002.07.24
申请号 AU20020249861 申请日期 2001.12.20
申请人 RAYTHEON COMPANY 发明人 JAMES A. CHEEVER;BILLY D. ABLES;CHARLES L. GOLDSMITH;JOHN C. EHMKE
分类号 B81B7/02;B81B7/00;H01H59/00;H01L23/04;H01L25/065;H05K1/03;H05K1/14;(IPC1-7):B81B7/00;H01L23/538 主分类号 B81B7/02
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