发明名称 |
Optical synthetic quartz glass, production method thereof, and optical member for excimer laser using the synthetic quartz glass |
摘要 |
<p>The present invention relates to a synthetic quartz glass, which is a material for producing an optical member having an excellent excimer laser resistance, and a production method thereof with a good productivity. That is, the synthetic quartz glass produced by vitrifying glass fine particles obtained by flame hydrolysis of an organodisilazane compound directly on a substrate having a birefringence index of 5 nm/cm or less, a refractive index difference ( DELTA n) of 2 x 10<-6> /cm or less, and an ArF saturated absorbance of 0.05 /cm or less at a pulse energy density of 100 mJ/cm<2>/pulse. The production method thereof comprises the steps of introducing an organodisilazane compound represented by a general formula 1: (R<1>)3SiNHSi(R<2>)3 wherein R<1> and R<2> represent the same or a different alkyl group having 1 to 3 carbon atoms, into a flame comprising a combustion gas and a combustion-supporting gas to generate silica fine particles, and accumulating the silica fine particles on a rotating heat resistant substrate to be a molten glass <IMAGE></p> |
申请公布号 |
EP0870737(B1) |
申请公布日期 |
2002.07.24 |
申请号 |
EP19980101100 |
申请日期 |
1998.01.22 |
申请人 |
SHIN-ETSU QUARTZ PRODUCTS CO., LTD.;SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
NISHIMURA, H.;FUJINOKI, A.;OTSUKA, H. |
分类号 |
C03B19/14;C03C3/06;C03C4/00;(IPC1-7):C03C3/06 |
主分类号 |
C03B19/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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