发明名称 HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To obtain the photosensitive material low in fog and freed of heat deformation on the surface at the time of heat development and superior in heat resistance and photographic performance by incorporating a polymer containing chlorinated polypropylene and phthalazine in one of the layers of this photosensitive material. SOLUTION: This photosensitive material has at least one photosensitive layer containing silver halide emulsion grains and a reducible nonphotosensitive silver source and a silver reducing agent on one side of a support and a layer containing the polymer comprising the chlorinated polypropylene, and the phthalazine. It is preferred that this polymer is contained in a non-photosensitive layer located farther than the photosensitive layers and it is further preferred that it is used for the binder of a surface protective layer. The polymer containing layer has a thickness of 0.1-10μm, preferably, 0.2-5μm, and an amount of the phthalazine to be added is 2-5000mg/m<2> , preferably, 10-3000mg/m<2> .
申请公布号 JPH09258366(A) 申请公布日期 1997.10.03
申请号 JP19960068069 申请日期 1996.03.25
申请人 FUJI PHOTO FILM CO LTD 发明人 HATAKEYAMA AKIRA
分类号 G03C1/76;G03C1/498;(IPC1-7):G03C1/498 主分类号 G03C1/76
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