发明名称 |
System and method for performing optical proximity correction on the interface between optical proximity corrected cells |
摘要 |
The system and method performs optical proximity correction on an integrated circuit (IC) mask design by initially performing optical proximity correction on a library of cells that are used to create the IC. The pre-tested cells are imported onto a mask design. All cells are placed a minimum distance apart to ensure that no proximity effects will occur between elements fully integrated in different cells. A one-dimensional optical proximity correction technique is performed on the mask design by performing proximity correction only on those components, e.g., lines, that are not fully integrated within one cell.
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申请公布号 |
US6425117(B1) |
申请公布日期 |
2002.07.23 |
申请号 |
US19970937296 |
申请日期 |
1997.09.29 |
申请人 |
LSI LOGIC CORPORATION |
发明人 |
PASCH NICHOLAS F.;EIB NICHOLAS K.;YATES COLIN D.;DOU SHUMAY |
分类号 |
G03F1/08;G06F17/50;H01L21/027;(IPC1-7):G06F17/50 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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