| 摘要 |
The present invention relates to a method and system for reusing a washing solution within a processor for processing photographic material. In the method and system of the present invention, sequential washing stages are applied to the processor. During one of the wash stages, and preferably a wash stage subsequent to an initial a first wash stage (a second wash stage), a volume of washing solution which is greater than the washing solution applied in the first wash stage is applied. The washing solution applied in the second or subsequent wash stage is subject to a chemical treatment such as an ion exchange, and is thereafter, recycled back to the processor for reuse in processing photographic material and/or cleaning the components of the processor.
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