Molybdenum-sulphur coatings

摘要

An unbalanced magnetron sputter ion plating system has a first magnetron with a first target of metal sulphide (e.g. MoS2) and a second magnetron with a second target of metal (e.g. Titanium). In order to recover water and sulphur impurities from the surfaces of the coating chamber the metal target is energised in a pre-coating ion cleaning operation. The Titanium target remains energised during the deposition of the molybdenum-sulphur coating to produce a MoxTiySz coating where x+y≈1 and Z≈2. Best results are achieved if the Titanium content is about 18% or less by weight of the total coating content.