发明名称 Semiconductor device, a method of manufacturing the same, and a semiconductor device protective circuit
摘要 A Schottky diode which provides a structure having no P-N junction while improving voltage resistance against a reverse bias when employed in combination with an insulated gate semiconductor device in particular. In order to attain the aforementioned object, a P-type impurity region having a surface exposed on a surface of an N-type semiconductor substrate functioning as a drain for functioning as a channel region and a gate insulator film covering it are provided. A gate electrode is extended from above the gate insulator film over a first taper of an oxide film. In a Schottky diode rendering the semiconductor substrate a cathode and having a boundary layer as a Schottky region, on the other hand, an anode electrode is extended from above the boundary layer over a second taper of the oxide film existing above an end portion of the boundary layer.
申请公布号 US6423598(B1) 申请公布日期 2002.07.23
申请号 US20000555522 申请日期 2000.06.08
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 TAKAHASHI HIDEKI;TOMINAGA SHUUICHI
分类号 H01L21/285;H01L21/311;H01L21/329;H01L29/06;H01L29/40;H01L29/739;H01L29/78;H01L29/872;(IPC1-7):H01L21/336;H01L21/822;H01L21/331;H01L29/74;H01L29/47 主分类号 H01L21/285
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