Quasi-continuous wave lithography apparatus and method

摘要

A lithography system for providing interconnections of integrated circuits on a substrate includes a laser system with a high reflector and an output coupler that define an oscillator cavity. A gain medium and a mode locking device are positioned in the oscillator cavity. A diode pump source produces a pump beam that is incident on the gain medium. A processor is coupled to the laser system and stores a representation of interconnections for the integrated circuit. An output beam directing apparatus is coupled to the processor and directs the output beam to the substrate and form the interconnections.