发明名称 |
Method for producing SOI wafers by delamination |
摘要 |
This invention provides a method for producing SOI wafers by delamination comprising the steps of preparing a first wafer (2) having an insulating layer (3) on its both major surfaces; providing two delamination planes (4; 4') in the interior of said first wafer (2); bonding a second wafer (1) on one side of the first wafer (2); bonding a third wafer (1') on the other side of the first wafer (2); and delaminating said second and third wafers (1; 1') from said first wafer (2) such that each of said second and third wafers (1; 1') carries a SOI layer (3, 7; 3', 7') on one of its major surfaces.
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申请公布号 |
US6420243(B1) |
申请公布日期 |
2002.07.16 |
申请号 |
US20000729502 |
申请日期 |
2000.12.04 |
申请人 |
MOTOROLA, INC. |
发明人 |
STANLEY TIMOTHY DARYL;STANLEY PETER |
分类号 |
H01L21/20;H01L21/30;H01L21/46;H01L21/762;(IPC1-7):H01L21/30 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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