| 摘要 |
The present invention provides a method for producing low flow rates of feedstock vapors used in the manufacture of silica glass. The method includes the steps of providing a constant flow of a liquid feedstock, mixing the flow of the liquid feedstock with an injector gas, expelling the mixture of liquid feedstock and inert gas from an injector orifice into a vaporizer chamber, flowing a carrier gas into the vaporizer chamber and through the mixture of liquid feedstock and injector gas, and vaporizing the liquid feedstock in the vaporizer chamber. The present invention is useful in the fabrication of planar silica waveguides. |
