发明名称 Liquid photocurable composition, water-based photocurable composition and resist pattern-forming method by use of the same
摘要 A liquid photocurable composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B-[X]n[Y]m-B, where X is represented by the formula:and Y is represented by the formula: -OOCHN-A-NHCOO(R2)-, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R1 is a structural unit derived from a carboxyl group-containing polyol compound, R2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other, and optionally containing a photopolymerizable compound other than the photopolymerizable polyurethane compound.
申请公布号 US6420090(B1) 申请公布日期 2002.07.16
申请号 US19990453504 申请日期 1999.12.03
申请人 KANSAI PAINT CO., LTD. 发明人 KOJIMA DAISUKE;IMAI GENJI;AKUI JUN;KOGURE HIDEO;ISOZAKI OSAMU
分类号 H05K3/00;G03F7/027;G03F7/039;G03F7/16;(IPC1-7):G03F7/037 主分类号 H05K3/00
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