| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning a fluororesin-made instrument, by which the fluororesin-made instrument, a fluororesin-made analytical instrument or the like to be used at a step to manufacturing a semiconductor or another step can be cleaned in a short time to be kept in a high-purity state by removing metallic impurities existing in each instrument. SOLUTION: This method for cleaning the fluororesin-made instrument comprises a step to expose the instrument to the pressurized vapor of an acid and a step to immerse the acid vapor-exposed instrument in a diluted acid. According to this cleaning method, an unimaginably small amount of metal existing in the instrument and metallic impurities existing inside the fluororesin can be removed.
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