| 发明名称 |
Methods for break-in and conditioning a fixed abrasive polishing pad |
| 摘要 |
The present invention relates to methods for break-in and conditioning polishing pads containing a fixed abrasive matrix. The polishing pads are useful for chemical-mechanical polishing (CMP). The present invention also relates to a method of determining the wear rate of a fixed abrasive polishing pad.
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| 申请公布号 |
US6419553(B2) |
申请公布日期 |
2002.07.16 |
| 申请号 |
US20010754424 |
申请日期 |
2001.01.04 |
| 申请人 |
RODEL HOLDINGS, INC. |
发明人 |
KOINKAR VILAS N.;GOLZARIAN REZA;VANHANEHEM MATTHEW;LUO QIULIANG;SHEN JAMES;BURKE PETER A. |
| 分类号 |
B24B37/04;B24B53/007;(IPC1-7):B24B49/00 |
主分类号 |
B24B37/04 |
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