发明名称 ELECTRON BEAM DRAWING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURED BY IT
摘要 PROBLEM TO BE SOLVED: To solve the problem of deteriorated throughput due to crosstalk noise generated by an electrostatic deflector via the capacitance between deflecting electrodes, the problem of unexpected deflection effects, and that of drawing not being made until the noise is reduced. SOLUTION: A shield electrode 12 at the ground potential is inserted into the gap between the concentrically and adjacently arranged deflecting electrodes 13. The output of a deflection control circuit 2 is connected to each deflecting electrode 13 by a shield wire where at least one side of a shield is set to the ground. By inserting the shield electrode 12, the crosstalk noise can be reduced between the deflecting electrodes 13, thus eliminating the need for waiting for drawing until noise is reduced, and hence increasing the speed of the throughput.
申请公布号 JP2002198294(A) 申请公布日期 2002.07.12
申请号 JP20000397032 申请日期 2000.12.27
申请人 HITACHI LTD 发明人 OKUMURA MASAHIDE;HAYATA YASUNARI;NAGATA KOJI
分类号 G03F7/20;H01J37/147;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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