| 摘要 |
PURPOSE: A method for manufacturing a back plate of a plasma display panel is provided to prevent the variation of the shape of a wall by forming electrodes of a stripe shape and an MOG(Metal On Groove) shape through etching process. CONSTITUTION: A wall is produced through etching process. A photo mask is designed to form a serif on both ends and a bending portion of a photoresist pattern. If an area where the serif can be formed on an end of the wall is AA, a width of a side etching is X, a width of a wall after the etching process is T, a width of an end side etching is Y, then AA=(4X+T)x(2X+2Y)-(2XxT). At least three serif points are formed in the form of a connection of a straight line, a curved line, or straight and curved lines. If an area where the serif can be formed on the bending portion of the wall is BB and a width of a side etching X, then BB=16X¬2. |
