| 摘要 |
PROBLEM TO BE SOLVED: To make a fine control easily possible for a position of a supply nozzle of resist liquid so that the resist liquid is accurately supplied to a fixed position on a wafer. SOLUTION: A transfer equipment 67 which holds a resist liquid supply nozzle 66 and transports it onto the wafer W is installed free to move on a rail 80 elongating in the direction of X. A cylinder is installed at a vertical arm portion 78, and is made extensible in the direction of Z. A driving belt 81 is provided at a horizontal arm portion 79, a nozzle holding member 75 is made free to move in the direction of Y by the driving belt 81. By such configuration, the supply nozzle 66 held by the nozzle holding member 75 becomes free to move three dimensionally, and the fine control of the resist liquid supply position can be performed accurately and easily. |
