METHOD AND DEVICE FOR INSPECTING ETCHING VARIANCE

摘要

PROBLEM TO BE SOLVED: To inspect etching variance readily and highly precisely in a short time. SOLUTION: Etching state is inspected by inputting a plurality of line patterns 2 of different line widths to a copper foil pattern mask 1 in advance, and recognizing the presence or absence of a line pattern remaining in an etched printed substrate 3 by using the copper foil pattern mask 1 of a plurality of line patterns 2 of different line widths.