| 发明名称 |
APPARATUS FOR CLEANING A SEMICONDUCTOR PROCESS CHAMBER |
| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for distributing a cleaning gas to a semiconductor substrate processing chamber. SOLUTION: The apparatus comprises a feed block disposed on top of the processing chamber and a support block disposed over the feed block. The feed block and the support block slidably interfit and are axially moveable with respect to one another.
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| 申请公布号 |
JP2002198365(A) |
申请公布日期 |
2002.07.12 |
| 申请号 |
JP20010356388 |
申请日期 |
2001.11.21 |
| 申请人 |
APPLIED MATERIALS INC |
发明人 |
PANG LILY L;CHO TOM K;ISHIKAWA TETSUYA |
| 分类号 |
H01L21/302;C23C16/455;F16L37/02;H01L21/3065;H01L21/31;(IPC1-7):H01L21/31;H01L21/306 |
主分类号 |
H01L21/302 |
| 代理机构 |
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代理人 |
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| 主权项 |
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