| 摘要 |
PROBLEM TO BE SOLVED: To obtain excellent exposure precision in the case that a catadioptric projection optical system having a plurality of partial lens-barrels having mutually intersecting optical axes is used. SOLUTION: A reticle R is illuminated with an exposure light IL in a vacuum ultraviolet region, and an image of a pattern of the reticle R which is obtained by using an projection optical system PL is projected on a wafer W. The projection optical system PL is provided with lens groups 24, 30, 32 and a reflection mirror block 29 which are held in the partial lens-barrel 16, and a lens group 22 and a concave mirror 21 which are held in the partial lens-barrel 17. The partial lens-barrel 16 is retained with a main body frame 13, and the partial lens-barrel 17 is retained with the partial lens-barrel 16. Position fluctuation amount of the partial lens-barrel 17 to the main body frame 13 is measured by using a laser interferometer 19. Position deviation amount of a projected image of the reticle pattern is predicted on the basis of the measured value, and a position of the reticle R or the wafer W is adjusted so as to cancel the position deviation amount.
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