发明名称 |
REFORMING METHOD FOR ANTIFERROMAGNETIC LAYER AND EXCHANGE COUPLED ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide an exchange coupled element which has a high unidirectional anisotropy constant Jk, high blocking temperature TB, and small film thickness and a reforming method for an antiferromagnetic layer. SOLUTION: The reforming method for the antiferromagnetic layer is characterized in that the antiferromagnetic layer is formed on a base body and thermally processed in a vacuum atmosphere of <=10-9 Torr in initial vacuum degree.
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申请公布号 |
JP2002198585(A) |
申请公布日期 |
2002.07.12 |
申请号 |
JP20000396895 |
申请日期 |
2000.12.27 |
申请人 |
TAKAHASHI KEN;HITACHI ZOSEN CORP |
发明人 |
OGAMI KOUJIROU;TSUNODA MASAKIYO;TAKAHASHI KEN |
分类号 |
G01R33/09;G11B5/39;H01F10/16;H01F10/32;H01F41/14;H01L43/08;H01L43/12;(IPC1-7):H01L43/12 |
主分类号 |
G01R33/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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