发明名称 REFORMING METHOD FOR ANTIFERROMAGNETIC LAYER AND EXCHANGE COUPLED ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide an exchange coupled element which has a high unidirectional anisotropy constant Jk, high blocking temperature TB, and small film thickness and a reforming method for an antiferromagnetic layer. SOLUTION: The reforming method for the antiferromagnetic layer is characterized in that the antiferromagnetic layer is formed on a base body and thermally processed in a vacuum atmosphere of <=10-9 Torr in initial vacuum degree.
申请公布号 JP2002198585(A) 申请公布日期 2002.07.12
申请号 JP20000396895 申请日期 2000.12.27
申请人 TAKAHASHI KEN;HITACHI ZOSEN CORP 发明人 OGAMI KOUJIROU;TSUNODA MASAKIYO;TAKAHASHI KEN
分类号 G01R33/09;G11B5/39;H01F10/16;H01F10/32;H01F41/14;H01L43/08;H01L43/12;(IPC1-7):H01L43/12 主分类号 G01R33/09
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