| 摘要 |
<p>PROBLEM TO BE SOLVED: To contribute to improvement in exposure accuracy. SOLUTION: The pattern of a mask R is projected onto a substrate W by a projection optical system PL for exposure. There are detection devices 73 and 74, and a drive control device. The detection devices 73 and 74 detect the relative speed between the projection optical system PL regarding the direction of nearly an optical axis of the projection optical system PL, and the substrate W. In the drive control device, based on a result detected by the detection devices 73 and 74, at least the substrate W is followed in the optical axis direction to the projection optical system PL for drive.</p> |
