PURPOSE: A wafer susceptor is provided to improve uniformity of thin film of a wafer by forming uniformly temperature of the wafer loaded on a susceptor. CONSTITUTION: A reception groove(20) of a concave shape is formed in a susceptor(10). A projection portion(16) is installed along the reception groove(20). A heater for heating a wafer is installed in a bottom part of the reception groove(20). In addition, the heater can be installed in the susceptor(10) or an outside of the susceptor(10). The wafer is loaded on the reception groove(10). The length of a projection of the projection portion(16) is 0.05 to 5mm. A space between the susceptor(10) and the wafer is 0.01 to 2mm. The susceptor(10) is formed by graphite or molybdenum.
申请公布号
KR20020058152(A)
申请公布日期
2002.07.12
申请号
KR20000085537
申请日期
2000.12.29
申请人
OPTOWELL CO., LTD.
发明人
JANG, HO JIN;JUNG, BYEONG JIN;LEE, GEON HWA;SON, JEONG GWON;SONG, YEONG HO;YANG, GYE MO