| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive type photoresist composition which is excellent in resist characteristics such as sensitivity, resolution, and the depth of focus, and can suppress the occurrence of a stationary wave and foreign matters. SOLUTION: The positive type photoresist composition comprises (A) a compound which generates an acid by being irradiated with active rays or radioactive rays, (B) a resin which is alkali-insoluble or hardly alkali-soluble, decomposes by the action of an acid, and enhances the solubility in an alkali developer, and (C) a compound represented by formula (I) [where R1 and R2 are independently a straight-chain alkyl group, a branched alkyl group, or a circular alkyl group; X is a straight-chain alkylene group, a branched alkylene group, or a circular alkylene group; m is an integer of 1 to 9]. |
