| 摘要 |
PURPOSE: A method for manufacturing a surface conduction electron emission display device is provided to simplify a manufacturing process and increase the uniformity of the device using a uniform film material by forming a natural gap of several tens of nanometer. CONSTITUTION: A gate electrode(11) having metal layer materials is formed and patterned on a substrate(10) by a sputtering or evaporation process. A cathode electrode(12) is formed by an electron beam evaporation or thermal evaporation process. A gap(13) of several tens of nanometer is formed from the cathode electrode(12). The gap between the gate electrode(11) and the cathode electrode(12) is etched by a wet etching or dry etching process. A thin dielectric layer(14) is formed on the respective electrodes(11,12) by evaporating dielectric materials through the evaporation process.
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