发明名称 |
A SELF-CLEANING OPTIC FOR EXTREME ULTRAVIOLET LITHOGRAPHY |
摘要 |
A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O2, H2, H2O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof. |
申请公布号 |
WO02054115(A2) |
申请公布日期 |
2002.07.11 |
申请号 |
WO2001US44707 |
申请日期 |
2001.12.12 |
申请人 |
EUV LIMITED LIABILITY CORPORATION;KLEBANOFF, LEONARD, E.;STULEN, RICHARD, H. |
发明人 |
KLEBANOFF, LEONARD, E.;STULEN, RICHARD, H. |
分类号 |
G21K5/00;B08B17/02;G02B5/08;G02B5/26;G02B5/28;G03F1/24;G03F7/20;G21K1/06;G21K5/02;H01L21/027 |
主分类号 |
G21K5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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