SEMICONDUCTOR MEMORY DEVICE

摘要

PURPOSE: A semiconductor memory device is provided to increase a process margin and to decrease defects found in the final electrical test, by preventing a critical dimension of an exposure process for forming a photoresist pattern from being changed after a heat treatment process. CONSTITUTION: A cell region and a core region are defined in a substrate. A photoresist layer is applied on the substrate to form a buffer region having no photoresist in the end of the cell region. A soft bake process and an exposure process are performed. A pose exposure bake(PEB) process is performed at a temperature lower than that of the soft bake process to measure the critical dimension.