发明名称 |
PROCESS FOR DEPOSITING A FILM ON A NANOMETER STRUCTURE |
摘要 |
A process of depositing a thin film on a nanometer structure in which a coating, which may be an aerogel material or metallic seed layer, is prepared. The coating is combined with a supercritical composition to form a supercritical coating composition. The supercritical coating composition is deposited upon a nanometer structure under supercritical conditions. Supercritical conditions are removed whereby the supercritical composition is removed and the coating solidifies into a thin solid film.
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申请公布号 |
US2002090458(A1) |
申请公布日期 |
2002.07.11 |
申请号 |
US20010755266 |
申请日期 |
2001.01.05 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
COTTE JOHN MICHAEL;MCCULLOUGH KENNETH JOHN;MOREAU WAYNE MARTIN;SIMONS JOHN P.;TAFT CHARLES J. |
分类号 |
B81C1/00;B05D1/18;B82B3/00;C23C18/00;(IPC1-7):B05D3/00 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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