发明名称 PROCESS FOR DEPOSITING A FILM ON A NANOMETER STRUCTURE
摘要 A process of depositing a thin film on a nanometer structure in which a coating, which may be an aerogel material or metallic seed layer, is prepared. The coating is combined with a supercritical composition to form a supercritical coating composition. The supercritical coating composition is deposited upon a nanometer structure under supercritical conditions. Supercritical conditions are removed whereby the supercritical composition is removed and the coating solidifies into a thin solid film.
申请公布号 US2002090458(A1) 申请公布日期 2002.07.11
申请号 US20010755266 申请日期 2001.01.05
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 COTTE JOHN MICHAEL;MCCULLOUGH KENNETH JOHN;MOREAU WAYNE MARTIN;SIMONS JOHN P.;TAFT CHARLES J.
分类号 B81C1/00;B05D1/18;B82B3/00;C23C18/00;(IPC1-7):B05D3/00 主分类号 B81C1/00
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