| 摘要 |
<p>A semiconductor integrated circuit, wherein preliminary elements (11) to (16) used as substitutes when circuits in functional blocks (2a) to (2f) are defective are displaced in the functional blocks (2a) to (2f) not in a dead space (100) between the functional blocks (2a) to (2f) so that the other functional blocks do not obstruct a wiring to the preliminary elements performed when the circuits in the functional blocks are defective and the length of the wiring to the preliminary elements can be shortened by wiring in the same functional blocks, and the preliminary elements are disposed in the functional blocks (2a) to (2f) already passing through a diffusion process so that an operation may be started from a metal wiring process.</p> |
