发明名称 |
OPTICAL ASSIST FEATURE FOR TWO-MASK EXPOSURE LITHOGRAPHY |
摘要 |
The present invention claims a binary mask printing a product feature which includes a narrow space; and a phase-shifting mask having an assist feature that fits within the narrow space when both masks are properly aligned in exposing a wafer. |
申请公布号 |
WO02054150(A2) |
申请公布日期 |
2002.07.11 |
申请号 |
WO2001US43941 |
申请日期 |
2001.11.13 |
申请人 |
INTEL CORPORATION;TEJNIL, EDITA |
发明人 |
TEJNIL, EDITA |
分类号 |
G03F1/00;G03F1/30 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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