发明名称 |
Composition of positive photosensitive resin precursor, and display device thereof |
摘要 |
A composition of a positive photosensitive resin precursor includes (a) a polyamic acid ester and/or a polyamic acid each having at least one selected from a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and a thiol group at the end of a principal chain of the polymer, (b) a compound having a phenolic hydroxyl group, and (c) a quinonediazide sulfnate. The composition can be subjected to dissolution in an alkaline developer.
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申请公布号 |
US2002090564(A1) |
申请公布日期 |
2002.07.11 |
申请号 |
US20010985059 |
申请日期 |
2001.11.01 |
申请人 |
SUWA MITSUHITO;MIYOSHI KAZUTO;TOMIKAWA MASAO |
发明人 |
SUWA MITSUHITO;MIYOSHI KAZUTO;TOMIKAWA MASAO |
分类号 |
G03F7/037;C08G73/10;C08K5/13;C08K5/42;C08L79/08;G03F7/004;G03F7/022;G03F7/023;H01L21/027;H01L27/32;(IPC1-7):G03F7/023;C09K19/38 |
主分类号 |
G03F7/037 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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