| 摘要 |
<p>An ion beam collimation system is used in ion implantation equipment to focus the beam and render the beam in parallel. A magnetic lens assembly produces these results by the action of opposed magnetic plates (214, 216) that produce magnetization vectors (204, 206) or opposite orientation. The magnetic field within a gap between the two plates varies linearly with distance from a central point (229) of neutral magnetic field.</p> |
