Optical component used in microlithographic systems for manufacturing highly integrated semiconductor components comprises a substrate with a multiple layer system with layers arranged on the surface of the substrate

摘要

Optical component comprises a substrate (2) with a multiple layer system (4) with layers (5-10) arranged on the surface (3) of the substrate. The layers are made from a high refracting or low refracting dielectric material. The first layer (5) on the substrate is free from magnesium fluoride. None of the layers is more than 0.5 lambda (where lambda = the working wavelength from the UV light wavelength region). Preferred Features: None of the layers is more than 0.3 lambda . The first layer is made from aluminum oxide. The low refracting dielectric material is made from magnesium fluoride. The substrate is made from quartz glass or a crystalline material, especially calcium fluoride.