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发明名称
FULLERENE COATED COMPONENT OF SEMICONDUCTOR PROCESSING EQUIPMENT
摘要
<p>A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a fullerene containing surface and process for manufacturing thereof.</p>
申请公布号
WO2002053797(A1)
申请公布日期
2002.07.11
申请号
US2001043844
申请日期
2001.11.23
申请人
发明人
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