发明名称 STAGE DEVICE, EXPOSURE DEVICE, METHOD OF ADJUSTING MULTIPOINT POSITION DETECTION SYSTEM, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <p>A stage device, wherein a reference plate (50) having a reference flat surface with a high flatness at the center part thereof and having a generally annular low rigid part lower in rigidity than the other part of the reference flat surface formed on one part of the outer peripheral part thereof is fixed to a table (18) for placing an object (W) thereon by plate springs disposed on the outer peripheral part of the reference plate at a plurality of positions, a deformation is not almost be produced on the reference flat surface inside the low rigid part since a stress concentration is produced at the low rigid part by a force for fixing the reference plate acting on the outer peripheral part of the reference plate and, since the plate springs are used as fixing members, the plate springs themselves are elastically deformed and an unnecessarily large force does not act on the reference plate, whereby the flatness of the reference flat surface can be maintained at a high level, and various measurements utilizing the reference flat surface and adjustments of equipment such as the adjustment of a multipoint AF system between sensor outputs can be performed accurately.</p>
申请公布号 WO2002054462(P1) 申请公布日期 2002.07.11
申请号 JP2001011480 申请日期 2001.12.26
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