发明名称 |
Novel photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same |
摘要 |
The present invention relates to novel monomers which can be used to form polymers which are useful in a photolithography employing a light source in the far ultraviolet region of the light spectrum, copolymers thereof, and photoresist compositions prepared therefrom. Photoresist monomers of the present invention are represented by the following Chemical Formula 1: wherein, R is substituted or non-substituted linear or branched (C1-C10) alkyl, substituted or non-substituted (C1-C10) ether, substituted or non-substituted (C1-C10) ester, or substituted or non-substituted (C1-C10) ketone; X and Y are independently CH2, CH2CH2, oxygen or sulfur; and i is 0 or an integer of 1 to 2.
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申请公布号 |
US2002091216(A1) |
申请公布日期 |
2002.07.11 |
申请号 |
US20020079753 |
申请日期 |
2002.02.19 |
申请人 |
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. |
发明人 |
LEE GEUN SU;KOH CHA WON;JUNG JAE CHANG;JUNG MIN HO;BAIK KI HO |
分类号 |
C07C69/753;C07D493/08;C08F32/00;C08F32/08;C08F232/00;G03F7/004;G03F7/039;(IPC1-7):C08F10/00;C08F36/00;C08F132/08;C08F136/00;C08F232/08;C08F236/00 |
主分类号 |
C07C69/753 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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