发明名称 Semiconductor substrate with functional circuit structures and dummy structures
摘要 In a semiconductor substrate, functional circuit structures and dummy structures are bounded by an insulation well that includes a buried diffusion region and a peripherally encompassing depth diffusion. A peripheral contact diffusion is additionally provided within a surface region defined by the depth diffusion.
申请公布号 US2002089030(A1) 申请公布日期 2002.07.11
申请号 US20010001174 申请日期 2001.11.02
申请人 KLING SABINE 发明人 KLING SABINE
分类号 H01L21/761;(IPC1-7):H01L29/00 主分类号 H01L21/761
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