| 摘要 |
<p>A production method for a projection optical system, capable of efficiently producing a projection optical system having very excellent optical characteristics sufficiently restricted in residual aberration, the method comprising a process of assembling a projection optical system, a process of measuring wave front aberration, a process of calculating respective components of wave front aberration with the measurement result allowed to correspond to zernike function, and first and second adjusting processes for adjusting optical members in the projection optical system according to respective components of wave front aberration obtained in the wave front component calculating process. Prior to the second adjusting process, a performance prediction process for predicting a performance after adjusted in the second adjusting process and a judging process for making judgement based on the performance predicted in the performance prediction process are implemented.</p> |
