| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning a substrate by satisfactory cleaning action at a low cost without destructing the environment. SOLUTION: This cleaning method comprises immersing the substrate as the subject to be cleaned in a cleaning bath 10 filled with a cleaning liquid 21 containing H2O2(hydrogen peroxide) and O3(ozone), heating the liquid 21 or supplying a high-energy ray such as an ultraviolet ray and an ultrasonic wave to the liquid 21 to generate active oxygen radicals consisting mainly of OH(hydroxyl radical) from H2O2(hydrogen peroxide) and O3(ozone) and decomposing contaminants on the surface of the substrate with the generated radicals.
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