SPUTTERING TARGET WITH LOW OXYGEN CONTENT

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target with low oxygen content, which prevents a characteristics deterioration of the formed film resulting from inevitably existing oxygen in an alloy material as contaminant. SOLUTION: The sputtering target with low oxygen content is characterized by adding carbon as oxygen scavenger to metal components composing a Cr alloyed sputtering target.