| 摘要 |
PROBLEM TO BE SOLVED: To improve uniformity of vacuum treatment characteristics, and as a result, improve product quality and yield, which leads to reduction of a production cost. SOLUTION: This device for vacuum treatment comprises a reaction vessel 101 capable of being depressurized, arranging several pieces of cylindrical substrates 102 which are articles to be treated, in the vessel. The bottom end and the upper end of the substrate 102 are respectively held by an electrode holder 104 which is an auxiliary substrate, and an electrode holder cap 103. A flange part 105 is provided to the electrode holder cap 103, for forcing high frequency electric field spreading over the electrode holder cap 103 to circumvent. The flange parts 105 are attached in a different position each other in the generator line, so as not to hit the flange part of adjacent substrates 102.
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