| 摘要 |
PROBLEM TO BE SOLVED: To realize continuous film formation over a long time in a saved space using a cheap raw material. SOLUTION: This vacuum deposition method for forming film on a substrate by melting and vaporizing a raw material accommodated in a crucible 5 with a heating means, in a vacuum chamber, comprises carrying out alternately the following steps: a step of sequentially pushing circumferentially arranged several bar type of raw materials 21, and a step of rotating these several bar type of raw material 21 in a circumferential direction, to heat and melt the pushed bar type of raw material 21 and supply it to a crucible 5.
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