METHOD FOR ALIGNING PATTERN OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for aligning a pattern of a semiconductor device is provided to shorten an interval of time necessary for aligning a mask, by simultaneously sensing an align state in an X-axis direction and an align state in a Y-axis direction. CONSTITUTION: X-Y coordinates of a quadrangle type are indicated in a predetermined region of a semiconductor substrate. The semiconductor substrate is installed in a stepper and a mask is positioned. The boundary lines at the right and left corners of the X-Y coordinates formed as the quadrangle type are sensed to detect X-coordinates while The boundary lines on and under the X-Y coordinates are sensed to detect Y-coordinates. A photolithography process is performed.