发明名称 BACKING PLATE FOR SPUTTERING TARGET
摘要 PROBLEM TO BE SOLVED: To provide a backing plate for sputtering with small heat expansion coefficient, high rigidity and light in weight as well as an aluminum alloy. SOLUTION: The backing plate is made from metal-ceramics composite material having a compound structure of Si and SiC.
申请公布号 JP2002194537(A) 申请公布日期 2002.07.10
申请号 JP20000388533 申请日期 2000.12.21
申请人 TAIHEIYO CEMENT CORP 发明人 SHIOGAI TATSUYA;TSUTO HIROYUKI;TAKEI YOSHIBUMI;AOKI ICHIRO
分类号 C04B35/565;C23C14/34 主分类号 C04B35/565
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