| 摘要 |
PURPOSE: An array substrate of a liquid crystal display and a method of fabricating the array substrate are provided to form a channel of the array substrate through one-time etching process so as to reduce the number of fabrication processing steps. CONSTITUTION: A gate electrode is formed on a transparent substrate(1). A gate insulating layer, an amorphous silicon layer(144a), an impurity-doped amorphous silicon layer and a metal layer strongly combined with fluorine are sequentially formed on the gate electrode. The impurity-doped amorphous silicon layer and the metal layer are patterned through photolithography, to form source and drain electrodes, a data line and a channel exposing a predetermined portion of the amorphous silicon layer. A passivation layer is formed on the substrate including the source and drain electrodes, and an active layer is formed on the passivation layer. A pixel electrode is formed on the substrate including the passivation layer. The channel is formed in a manner that a portion of the metal layer, placed between the source and drain electrodes, is etched using a mixture of gases containing F, Cl and oxygen and a portion of the impurity-doped amorphous silicon layer, placed between the source and drain electrodes, is etched using a mixture of gases containing F and Cl.
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