| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a processing method which can finish overall neatly and accurately, without needing a difficult control such as a control for etching rate, without a problem of residual ion which harms transparency of a glass substrate, and without staining the surface by the removed material, when repairing unprocessed parts of dug grooves of a Levenson mask. SOLUTION: A repairing method comprises impregnating gallium ion into required depth of a specified position on a glass substrate which corresponds to the unprocessed parts of the dug grooves in the Levenson mask by using focused ion beam equipment, immersing the substrate in which the gallium ion has been impregnated, into an alkali solution, and partially dissolving and removing the part in which the gallium ion was impregnated.</p> |
