| 摘要 |
PROBLEM TO BE SOLVED: To provide a device for cleaning a subject to be cleaned, which is constituted of simple and small-sized equipment and has high cleaning capacity, and to provide a method for cleaning a subject to be cleaned in a short time by using the device. SOLUTION: This method comprises an immersion step to supply hot water of 50 deg.C to an immersion tank 11 and reduce the pressure of the vicinity of the tank 11 so that the minute opening 52 of a subject 50 to be cleaned is also filled with the hot water satisfactorily by the pressure reduction, a heating step to replace the inside of the tank 11 with hot water of 85 deg.C, heat the subject 50 and transfer the heated subject 50 to a pressure reducing chamber 40 and a bumping step to reduce the pressure of the chamber 50 drastically so that the water filled in the subject 50 exhibits a bumping phenomenon, namely, becomes steam to flow through the opening 52 as a large flow rate of a steam current at a high speed, foreign matter remaining in the opening 52 is spouted to the outside of the subject 50 together with the steam by the steam current and the subject 50 is dried during the bumping and cooled by latent heat of vaporization.
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